srini@arizona.edu

520.626.5164

Full details at profiles.arizona.edu

Srini Raghavan

Professor Emeritus of Materials Science and Engineering

Srini Raghavan's Full CV (PDF)

Courses

Solid State Chemistry

MSE 110 (Spring 2018)

Independent Study

MSE 399 (Fall 2018)
MSE 499 (Spring 2021)
MSE 499 (Spring 2020)
MSE 599 (Fall 2016)

Corrosion + Degradation

CHEE 535 (Fall 2017)
ENGR 435 (Fall 2017)
MSE 435 (Fall 2017)
MSE 535 (Fall 2017)

Semiconductor Processing

ECE 446 (Fall 2020)
ECE 446 (Fall 2019)
ECE 446 (Fall 2018)
ECE 446 (Fall 2017)
ECE 446 (Fall 2016)
ECE 546 (Fall 2020)
ECE 546 (Fall 2019)
ECE 546 (Fall 2018)
ECE 546 (Fall 2017)
ECE 546 (Fall 2016)
MSE 446 (Fall 2020)
MSE 446 (Fall 2019)
MSE 446 (Fall 2018)
MSE 446 (Fall 2017)
MSE 446 (Fall 2016)
MSE 546 (Fall 2020)
MSE 546 (Fall 2019)
MSE 546 (Fall 2018)
MSE 546 (Fall 2017)
MSE 546 (Fall 2016)

Semiconductor Processing Lab

MSE 447L (Spring 2017)
MSE 447L (Spring 2016)
MSE 547L (Spring 2017)
MSE 547L (Spring 2016)

Internship

MSE 493 (Fall 2019)

Senior Capstone

MSE 498 (Spring 2021)
MSE 498 (Fall 2020)
MSE 498 (Spring 2020)
MSE 498 (Fall 2019)
MSE 498 (Spring 2018)
MSE 498 (Fall 2017)
MSE 498 (Fall 2016)
MSE 498 (Spring 2016)

Appld Surface Chemistry

MSE 503 (Fall 2019)
MSE 503 (Fall 2016)

Research

CHEE 900 (Spring 2020)
CHEE 900 (Spring 2017)
CHEE 900 (Fall 2016)
MSE 900 (Spring 2018)
MSE 900 (Fall 2017)
MSE 900 (Spring 2017)
MSE 900 (Fall 2016)
MSE 900 (Spring 2016)

Thesis

MSE 910 (Spring 2021)
MSE 910 (Fall 2020)
MSE 910 (Spring 2020)
MSE 910 (Fall 2019)
MSE 910 (Spring 2019)
MSE 910 (Fall 2018)
MSE 910 (Spring 2018)
MSE 910 (Fall 2017)
MSE 910 (Spring 2017)
MSE 910 (Fall 2016)
MSE 910 (Spring 2016)

Dissertation

CHEE 920 (Spring 2021)
CHEE 920 (Fall 2020)
CHEE 920 (Spring 2020)
CHEE 920 (Fall 2019)
CHEE 920 (Spring 2019)
CHEE 920 (Fall 2017)
CHEE 920 (Spring 2017)
CHEE 920 (Fall 2016)
CHEE 920 (Spring 2016)
MSE 920 (Spring 2023)
MSE 920 (Fall 2022)
MSE 920 (Spring 2022)
MSE 920 (Fall 2021)
MSE 920 (Spring 2021)
MSE 920 (Fall 2020)
MSE 920 (Spring 2020)
MSE 920 (Fall 2019)
MSE 920 (Spring 2019)
MSE 920 (Fall 2018)
MSE 920 (Spring 2018)
MSE 920 (Fall 2017)
MSE 920 (Spring 2017)
MSE 920 (Fall 2016)

Selected Publications

Journals/Publications

Kumari, S., Keswani, M., Singh, S., Beck, M., Liebscher, E., & Raghavan, S. (2014). Enhanced megasonic processing of wafers in MegPie® using carbonated ammonium hydroxide solutions. Microelectronic Engineering, 114, 148-153.
Taubert, J., & Raghavan, S. (2014). Effect of composition of post etch residues (PER) on their removal in choline chloride-malonic acid deep eutectic solvent (DES) system. Microelectronic Engineering, 114, 141-147.
Han, Z., Keswani, M., & Raghavan, S. (2013). Megasonic cleaning of blanket and patterned samples in carbonated ammonia solutions for enhanced particle removal and reduced feature damage. IEEE Transactions on Semiconductor Manufacturing, 26(3), 400-405.
Keswani, M., Raghavan, S., & Deymier, P. (2013). A novel way of detecting transient cavitation near a solid surface during megasonic cleaning using electrochemical impedance spectroscopy. Microelectronic Engineering, 108, 11-15.
Keswani, M., Raghavan, S., & Deymier, P. (2013). Characterization of transient cavitation in gas sparged solutions exposed to megasonic field using cyclic voltammetry. Microelectronic Engineering, 102, 91-97.
Keswani, M., Raghavan, S., & Deymier, P. (2013). Effect of non-ionic surfactants on transient cavitation in a megasonic field. Ultrasonics Sonochemistry, 20(1), 603-609.
Siddiqui, S., Keswani, M., Brooks, B., Fuerst, A., & Raghavan, S. (2013). A study of hydrogen peroxide decomposition in ammonia-peroxide mixtures (APM). Microelectronic Engineering, 102, 68-73.
Taubert, J., Keswani, M., & Raghavan, S. (2013). Post-etch residue removal using choline chloride-malonic acid deep eutectic solvent (DES). Microelectronic Engineering, 102, 81-86.
Govindarajan, R., Keswani, M., Raghavan, S., & Somogyi, A. (2012). Effect of pretreatment of high-dose implanted resists by activated hydrogen peroxide chemical systems for their effective removal by conventional sulfuric-peroxide mixtures. IEEE Transactions on Semiconductor Manufacturing, 25(3), 523-530.
Kumari, S., Keswani, M., Singh, S. K., Beck, M., Leibscher, E., Deymier, P., & Raghavan, S. (2012). Control of sonoluminescence in carbon dioxide containing DI water at near neutral pH conditions. Diffusion and Defect Data Pt.B: Solid State Phenomena, 187, 177-180.
Padmanabhan, D., Raghavan, S., & Keswani, M. (2012). Effect of water addition to choline chloride-urea deep eutectic solvent (DES) on the removal of post-etch resid ues formed on copper. IEEE Transactions on Semiconductor Manufacturing, 25(3), 516-522.
Pandit, V., Keswani, M., Siddiqui, S., & Raghavan, S. (2012). Comparison of gold particle removal from fused silica and thermal oxide surfaces in dilute ammonium hydroxide solutions. Diffusion and Defect Data Pt.B: Solid State Phenomena, 187, 159-162.
Elguindi, J., Moffitt, S., Hasman, H., Andrade, C., Raghavan, S., & Rensing, C. (2011). Metallic copper corrosion rates, moisture content, and growth medium influence survival of copper ion-resistant bacteria. Applied Microbiology and Biotechnology, 89(6), 1963-1970.
Govindarajan, R., Keswani, M., & Raghavan, S. (2011). Investigation of galvanic corrosion characteristics between tantalum nitride and poly silicon in dilute hf solutions. ECS Transactions, 41(5), 15-21.
Govindarajan, R., Siddiqui, S., Keswani, M., Raghavan, S., Singh, D. R., & Chawla, N. (2011). Electrochemical mechanical removal of Ta films in dihydroxybenzene sulfonic acid solutions containing potassium iodate. Electrochemical and Solid-State Letters, 14(4), H156-H160.